- AutorIn
- R. Wenisch
- F. Lungwitz
- D. Hanf
- R. Heller
- J. Zscharschuch
- R. Hübner
- J. von Borany
- G. Abrasonis
- S. Gemming
- R. Escobar-Galindo
- M. Krause
- Titel
- Cluster tool for in situ processing and comprehensive characterization of thin films at high temperatures
- Zitierfähige Url:
- https://nbn-resolving.org/urn:nbn:de:bsz:d120-qucosa2-339264
- Quellenangabe
- Analytical Chemistry Verlag: ACS Publications
Erscheinungsjahr: 2018
Jahrgang: 90
Seiten: 7837-7842
DOI: 10.1021/acs.analchem.8b00923 - Abstract (EN)
- A new cluster tool for in situ real-time processing and depth-resolved compositional, structural and optical characterization of thin films at temperatures from -100 to 800 °C is described. The implemented techniques comprise magnetron sputtering, ion irradiation, Rutherford backscattering spectrometry, Raman spectroscopy and spectroscopic ellipsometry. The capability of the cluster tool is demonstrated for a layer stack MgO/ amorphous Si (~60 nm)/ Ag (~30 nm), deposited at room temperature and crystallized with partial layer exchange by heating up to 650°C. Its initial and final composition, stacking order and structure were monitored in situ in real time and a reaction progress was defined as a function of time and temperature.
- Freie Schlagwörter (EN)
- Cluster tool, thin films, in situ, high temperature, Rutherford backscattering, Raman spectroscopy, ellipsometry, metal-induced crystallization
- URN Qucosa
- urn:nbn:de:bsz:d120-qucosa2-339264
- Veröffentlichungsdatum Qucosa
- 07.05.2019
- Dokumenttyp
- Artikel
- Sprache des Dokumentes
- Englisch